Cart (Loading....) | Create Account
Close category search window

Mass-loaded cantilevers with suppressed higher-order modes for magnetic resonance force microscopy

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

The purchase and pricing options are temporarily unavailable. Please try again later.
6 Author(s)
Chui, B.W. ; IBM Res. Div., Almaden Res. Center, San Jose, CA, USA ; Hishinuma, Y. ; Budakian, R. ; Mamin, H.J.
more authors

We describe the design, fabrication and testing of mass-loaded cantilevers for electron-spin magnetic resonance force microscopy. These single-crystal silicon cantilevers are designed to have large gaps in their thermal mode spectra so as to reduce thermal noise near the electron-spin Rabi frequency. Each cantilever typically consists of a 2 /spl mu/m thick mass suspended at the end of a 0.1 /spl mu/m thick hinge. The fabrication process starts with an SOI wafer followed by selective silicon epitaxy, cantilever patterning, and backside release. The focus of the process is on precise thickness control and material homogeneity. We will present characterization results for these cantilevers at room and low temperatures and discuss the impact of these devices on magnetic resonance force microscopy measurements.

Published in:

TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003  (Volume:2 )

Date of Conference:

8-12 June 2003

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.