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Sub-90 nm technologies-challenges and opportunities for CAD

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3 Author(s)
Karnik, T. ; Circuit Res., Intel Labs., Hillsboro, OR, USA ; Borkar, S. ; De, V.

Future high performance microprocessor design with technology scaling beyond 90 nm will pose two major challenges: (1) energy and power, and (2) parameter variations. Design practice will have to change from deterministic design to probabilistic and statistical design. This paper discusses circuit techniques and design automation opportunities to overcome the challenges.

Published in:

Computer Aided Design, 2002. ICCAD 2002. IEEE/ACM International Conference on

Date of Conference:

10-14 Nov. 2002

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