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Browse Journals & Magazines > Manufacturing Technology, IEE ...> Volume:2 Issue:2 Help

Theory and Practice of MOS Processing Techniques-1973

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2 Author(s)
Kmeta, W. ; SMC Microsystems Corp.,Hauppauge, NY ; Nadan, J.S.

Current industrial practice and theory applicable to the fabrication of low-voltage p-channel metal-oxide-semiconductor (PMOS) devices is summarized. An extensive bibliography and design parameter graphs are presented.

Published in:
Manufacturing Technology, IEEE Transactions on  (Volume:2 ,  Issue: 2 )

Date of Publication: Dec 1973

Page(s):
37 - 49
ISSN :
0046-838X
Digital Object Identifier :
10.1109/TMFT.1973.1135507
Date of Current Version :
06 January 2003
Issue Date :
Dec 1973

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