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Thin Film Capacitor Parameter Studies

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1 Author(s)
Schenkel, F. ; App. Phys. Lab., Silver Spring

A discussion is presented relating the electrical, optical and physical parameters of thin film capacitors. A study of silicon monoxide dielectric films has been conducted. Both the electrical and optical characteristics were investigated in a series of planned experiments. A relationship between dielectric constant, refractive index and the thin film vacuum deposition parameters of the dielectric films has been established. The results of these experiments have helped facilitate the fabrication of more stable and reliable components. The effects of component annealing are presented. Proper heat treatment of the device has yielded improved stability and reduced the dissipation of limited available power. The control instrumentation for the vacuum deposition of thin films is discussed. The optical measuring techniques employed to obtain refractive index and dielectric constant shall be presented. Both multiple beam and two beam interferometry have been utilized in these measurements.

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Component Parts, IEEE Transactions on  (Volume:11 ,  Issue: 2 )