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Computer-aided recipe generation for LPCVD reactors

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2 Author(s)
Lin, K.-K. ; Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA ; Spanos, Costas J.

A computer-aided-design (CAD) system which has been developed to assist the process engineer in choosing the best compromise between product and equipment performance is described. A formal, systematic methodology that facilities the task of recipe design for low pressure chemical-vapor-deposition (LPCVD) reactors is discussed. Recipe generation via interactive response surface exploration and automatic recipe generation via numerical optimization are discussed

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 1990. ASMC 90 Proceedings. IEEE/SEMI 1990

Date of Conference:

11-12 Sep 1990