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Ti Zr dielectric layers deposited by hot target reactive magnetron sputtering

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3 Author(s)
J. Domaradzki ; Fac. of Microsystem Electron. & Photonics, Wroclaw Univ. of Technol., Poland ; E. Prociow ; D. Kaczmarek

TiO2 - doped zirconium layers were deposited on silica substrate. It has been shown, that using a new hot target magnetron sputtering method it is possible to manufacture thin polycrystalline, dielectric films on amorphous substrate from metallic target even if post-deposition annealing was not done. Using X-Ray Diffraction (XRD) examinations crystalline phases of rutile were found both in as-deposited and in annealed samples. Scanning electron micrographs showed polycrystalline morphology with homogenous distribution of crystallites.

Published in:

Advanced Semiconductor Devices and Microsystems, 2002. The Fourth International Conference on

Date of Conference:

14-16 Oct. 2002