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Magnetic coupling between two Ni-Fe layers separated by SiO

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4 Author(s)
M. Masuda ; Mie University, Tsu, Japan ; T. Utsunomiya ; T. Fujii ; S. Uchiyama

The magnetic coupling between the magnetization in two nonmagnetostrictive Ni-Fe layers separated by a SiO layer has been investigated by means of a transverse susceptibility measurement. The main results are that 1) the coupling energy Ec per Unit area of the multilayered film has a form of E_{c}= -A \cos (\phi_{1}-\phi_{2}) , where \phi_{1}-\phi_{2} is the angle between the magnetization vectors in the two Ni-Fe layers, and 2) the dependence of the coupling constant on the thickness b of the intermediate SiO layer can be interpreted quantitatively by the combination of the coupling energy due to Néel's topography model and that due to the magnetostatic interaction between the magnetic free poles appearing at the edges of the two Ni-Fe layers. The former coupling energy is given by E_{c1} = -frac{p}{2\sqrt {2}}\omega ^{2}M^{2} \exp(-\sqrt {2}pb) \cos (\phi_{1}-\phi_{2}) where p=2\pi/L and L and w are the wavelength and the amplitude of the undulation of the interface between Ni-Fe and SiO layers, respectively. The latter is given by E_{c2} = frac{2M^{2}D^{2}}{R} \ln (frac{R}{D+b}) \cos (\phi_{1}-\phi_{2}) where D is the thickness of each Ni-Fe layer, and R is the radius of the film.

Published in:

IEEE Transactions on Magnetics  (Volume:8 ,  Issue: 3 )