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Semiconductor microlenses fabricated by one-step focused ion beam direct writing

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2 Author(s)
Yongqi Fu ; Sch. of Mech. & Production Eng., Nanyang Technol. Univ., Singapore ; Bryan, N.K.

We fabricated a refractive semiconductor micro-lenses using a focused ion beam (FIB) direct writing technique. The simple one-step FIB process produced high-quality micro-lenses of silicon, the most popular and low cost semiconductor material used in optoelectronics. A spherical Si microlens with a nominal lens diameter of 48 μm exhibited a radius curvature and focal length of 100 and 40 μm, respectively. The maximum derivation between the measured and designed profiles is less than λ/100. The surface roughness, RMS, measured by use of atomic force microscope in 1× 1 μm2 square area, is 1.1 nm. This microlens fabrication method could be readily applicable due to the simplicity in processing and the high-quality results

Published in:
Semiconductor Manufacturing, IEEE Transactions on  (Volume:15 ,  Issue: 2 )

Date of Publication: May 2002

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