Cart (Loading....) | Create Account
Close category search window
 

Models for subthreshold and above-threshold currents in 0.1-μm pocket n-MOSFETs for low-voltage applications

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Yon-Sup Pang ; Dept. of Electr. & Comput. Eng., Arizona Univ., Tucson, AZ, USA ; Brews, J.R.

We present a model for subthreshold current in deep-submicrometer pocket n-MOSFETs based on the diffusion current transport equation, the quasi-two-dimensional (2-D) Poisson equation and a doping-density-dependent mobility model, and a model for above-threshold current in deep-submicrometer pocket n-MOSFETs based on the drift-diffusion current transport equation for nonuniformly doped MOSFETs, the charge-sheet approximation, a solution of the one-dimensional (1-D) Poisson equation, a quasi-2-D model for the velocity saturation region, longitudinal- and transverse-field-dependent mobility models. The analytic models for subthreshold and above-threshold currents are used to efficiently construct viable design spaces locating well-designed 0.1-μm pocket n-MOSFETs that meet all the device design specifications of off-state (leakage) current, on-state (drive) current, and power-supply voltage. The model for subthreshold current correctly predicts an increase in off-state current in sub-100 nm pocket n-MOSFETs. The model for above-threshold current generates ID-VDS characteristics of a variety of deep-submicrometer pocket n-MOSFETs

Published in:

Electron Devices, IEEE Transactions on  (Volume:49 ,  Issue: 5 )

Date of Publication:

May 2002

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.