Close category search window
 

The short-loop process tuning & yield evaluation by using the addressable failure site test structures (AFS-TS)

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Doong, K.Y.-Y. ; Worldwide Semicond. Manuf. Corp., Hsin-Chu, Taiwan ; Hsieh, S. ; Sheng-Che Lin ; Binson Shen
more authors

This work describes the implementation of a novel test structure called addressable failure site test structure (AFS-TS) for via process optimization including the liner layer and W-CVD filling process. It manifests the design, defect detection and yield analysis of addressable failure site test structures. The novel test structures are used to discriminate the yield loss issues based on the high spatial defect detection resolution within 2000×2200 μm2 of interconnect test structures. A test chip of 4.0×6.6 mm2 containing nine types of test structures was implemented using 0.25 μm logic backend of line process. This simple and efficient killer defect identification of process steps is employed as yield enhancement strategy

Published in:
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on

Date of Conference: 2000

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.