Cart (Loading....) | Create Account
Close category search window
 

Post-CMOS processing for high-aspect-ratio integrated silicon microstructures

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Huikai Xie ; Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA ; Erdmann, L. ; Xu Zhu ; Gabriel, K.J.
more authors

Presents a new fabrication sequence for integrated-silicon microstructures designed and manufactured in a conventional complementary metal-oxide-semiconductor (CMOS) process. The sequence employs a post-CMOS deep silicon backside etch, which allows fabrication of high aspect ratio (25:1) and flat (greater than 10 mm radius of curvature) MEMS devices with integrated circuitry. A comb-drive resonator, a cantilever beam array and a z-axis accelerometer were fabricated using this process sequence. Electrical isolation of single-crystal silicon was realized by using the undercut of the reactive ion etch (RIE) process. Measured out-of-plane curling across a 120-μm-wide 25-μm-thick silicon released plate was 0.15 μm, which is about ten times smaller than curl of the identical design as a thin-film CMOS microstructure. The z-axis DRIE accelerometer structure is 0.4 mm by 0.5 mm in size and has a 25-μm-thick single-crystal silicon proof mass. The measured noise floor is 1 mG/√Hz, limited by electronic noise. A vertical electrostatic spring "hardening" effect was theoretically predicted and experimentally verified

Published in:

Microelectromechanical Systems, Journal of  (Volume:11 ,  Issue: 2 )

Date of Publication:

Apr 2002

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.