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157 nm lithography for 70 nm technology node

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1 Author(s)
Itani, T. ; Semicond. Leading Edge Technol. Inc., Yokohama, Japan

157 nm lithography is the most promising technology for 70 nm technology node of semiconductor devices. Many efforts have been reported on the exposure tool, the laser, the resist materials, the resist processing and the mask materials. In this article, we have demonstrated our recent evaluation results of the exposure tool, the resist materials and processing and the mask materials.

Published in:

Microprocesses and Nanotechnology Conference, 2001 International

Date of Conference:

Oct. 31 2001-Nov. 2 2001