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Long Ni cantilever fabrication with new sacrificial process

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4 Author(s)
Kawata, H. ; Dept. of Phys. & Electron., Osaka Prefecture Univ., Japan ; Tabata, J. ; Yasuda, M. ; Murata, K.

Stiction of microstructure to a substrate by a capillary force is one of the main difficulties in surface micromachining. When the sacrificial layer is removed by a plasma etching, the stiction problem must be greatly reduced. However, a sample may be damaged by a plasma, because a long etching time is often necessary. In this report a new sacrificial process is proposed. Sacrificial layer is removed by a short plasma etching time. The long length Ni cantilevers are fabricated with this new process. The mechanical properties of the fabricated cantilevers are examined.

Published in:

Microprocesses and Nanotechnology Conference, 2001 International

Date of Conference:

Oct. 31 2001-Nov. 2 2001

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