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Development of low energy e-beam proximity projection lithography: LEEPL

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1 Author(s)

LEEPL (Low Energy Electron Beam Proximity Projection Lithography) is proposed as a solution to the current cost issues in the semiconductor industry. Thanks to a simple tool configuration and small mask pattern area, LEEPL promises both tools and masks to be low cost. The author deals with mask issues, describes the proof of concept and the next step, and discusses the formation of an LEEPL consortium.

Published in:

Microprocesses and Nanotechnology Conference, 2001 International

Date of Conference:

Oct. 31 2001-Nov. 2 2001