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Development of 3-D focused-ion-beam (FIB) etching methods for nano- and micro-technology application

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6 Author(s)
Kim, S.-J. ; NICHE, Tohoku Univ., Sendai, Japan ; Yamashita, T. ; Lee, K.-Y. ; Nagao, M.
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We have developed a 3-D FIB etching method for making 3-D micro-devices and sensors based on nano- and micro-technology. We fabricated single electron tunneling (SET) devices on a Bi-2201 single crystal whisker. We also describe 3-D FIB etching methods using layered single crystal whiskers as examples. These methods offer simple in situ etching and evaporation processes in FIB systems for making a micro area of stacks.

Published in:

Microprocesses and Nanotechnology Conference, 2001 International

Date of Conference:

Oct. 31 2001-Nov. 2 2001