By Topic

300 mm process integration for 0.13 /spl mu/m generation with Cu/low-k interconnect technology

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

21 Author(s)
Chang, W. ; Taiwan Semicond. Manuf. Co., Tainan, Taiwan ; Chen, C.C. ; Lu, J.C. ; Liou, S.J.
more authors

Successfully transferring to a 300 mm process from a leading-edge 200 mm 0.13 /spl mu/m CMOS technology using 248 nm lithography and Cu/low-k interconnect is demonstrated in the TSMC 300 mm Pilot Line. To achieve good performance with decent throughput, a 1 to 2.5 scaling factor for process power and gas flow is applicable for CVD and dry etch. Good within wafer (WIW) gap-fill for STI and ILD is obtained. WIW thin oxide non-uniformity is less than +/-1.6% by introducing O/sub 2/ gas at the ramp down stage. An OPC model set up for the 200 mm process can be used directly in the 300 mm process with comparable WIW CD uniformity. With good poly CD uniformity from proper etch process tuning, acceptable line end shortening control for 0.10 /spl mu/m devices is shown. In Cu/low-k interconnect, good patterning integrity is achieved with no edge delamination after Cu CMP. A good yield of 880 k via chain with tight multi-level Rs and low leakage is obtained. An excellent yield of 4 metal levels 4M SRAM that is comparable to 200 mm is also achieved by this 300 mm process.

Published in:

Electron Devices Meeting, 2001. IEDM '01. Technical Digest. International

Date of Conference:

2-5 Dec. 2001