The authors describe a simple, high performance thin-film silicon-on-insulator (TFSOI) complementary BiCMOS (C-BiCMOS) technology, which can be used in low power wireless communication applications. In this technology, a novel, high performance lateral BJT structure is implemented using a gate spacer to obtain a thin base width and a minimum base linkage to the external base for minimized base resistance. A lateral NPN transistor (with maximum oscillation frequency (fmax ) of 29 GHz, cut-off frequency (fT) of 8 GHz, current gain (hFE) of 78, and collect-emitter breakdown voltage with base open (BVCEO) of 5 V), a lateral PNP transistor (hFE of 51 and BVCEO of 4.5 V), and NMOS and PMOS transistors (0.5 μm channel length and 5 μm channel width, 0.5/-0.8 V threshold voltage) am fabricated. This technology provides very promising low power, low cost, and high performance solutions for RF mixed-signal system-on-a-chip (SoC) applications
Published in:
Electron Devices, IEEE Transactions on
(Volume:49
,
Issue:
1
)
Date of Publication: Jan 2002