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The impact of postbreakdown gate leakage on MOSFET RF performances

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2 Author(s)
Pantisano, L. ; IMEC, Leuven, Belgium ; Cheung, K.P.

When the gate-oxide of a MOSFET breaks down, a leakage path is created between channel and gate. In this work, we demonstrate that a simple leakage current increase model can predict the impact of gate-oxide breakdown on MOSFET performance from dc to microwave frequency. We show that severe reduction in RF performance due to input/output mismatch and a gain reduction can result from gate-oxide breakdown.

Published in:
Electron Device Letters, IEEE  (Volume:22 ,  Issue: 12 )

Date of Publication: Dec. 2001

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