A mode projecting method for the quasi-static analysis of electrooptic device electrodes considering finite metallization thickness and anisotropic substrate

The method presented is an extension of the mode matching method (MMM), utilizing the idea of base transformation and vector projection in inner-product space. In contrast to the conventional MMM, this approach decouples the order of the linear equation system from the truncation index of the mode expansion series and is free from the relative convergence phenomenon of the MMM. Coplanar strip electrodes are analyzed, and the effects of the metallization thickness, buffer layer, and conducting enclosure on the effective permittivity, characteristic impedance, and electric field in the substrate are presented.<
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