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A comparison of strong and weak distributed transverse coupling between VLSI interconnects

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1 Author(s)
Ozkaramanli, H. ; Dept. of Electr. & Electron. Eng., Eastern Mediterranean Univ., Mersin, Cyprus

Crosstalk under strong and weak coupling is compared and the two cases are shown to be identical for the important low-frequency range, where the significant components of the input excitation lie. The validity of weak coupling is established in terms of rise time and physical length of interconnects

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Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on  (Volume:20 ,  Issue: 12 )