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Early history of vacuum arc deposition

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1 Author(s)
Boxman, R.L. ; Fleischman Fac. of Eng., Tel Aviv Univ., Israel

Vacuum arc deposition (VAD) was first investigated at the end of the 19th century by A. W. Wright and T. A. Edison, as mirror coatings and seed layers for phonogram replication molds, respectively. The early research anticipated later developments, including cathode shielding, multi-layer coatings, substrate motion, and hybrid processing

Published in:

Plasma Science, IEEE Transactions on  (Volume:29 ,  Issue: 5 )