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Improving the RF performance of 0.18 μm CMOS with deep n-well implantation

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6 Author(s)
Jiong-Guang Su ; Inst. of Electron., Nat. Chiao Tung Univ., Hsinchu, Taiwan ; Heng-Ming Hsu ; Shyh-Chyi Wong ; Chun-Yen Chang
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The radio-frequency (RF) figures of merit of 0.18 μm complementary metal-oxide-semiconductor (CMOS) technology are investigated by evaluating the unity-current-gain cutoff frequency (FT) and maximum oscillation frequency (Fmax). The device fabricated with an added deep n-well structure is shown to greatly enhance both the cutoff frequency and the maximum oscillation frequency, with negligible DC disturbance. Specifically, an 18% increase in FT and 25% increase in Fmax are achieved. Since the deep n-well implant can be easily adopted in a standard CMOS process, the approach appears to be very promising for future CMOS RF applications.

Published in:

IEEE Electron Device Letters  (Volume:22 ,  Issue: 10 )