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Induced uniaxial magnetic anisotropy and film magnetostriction in very thin permalloy films

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6 Author(s)
I. Katada ; Res. Inst. of Electr. Commun., Tohoku Univ., Sendai, Japan ; T. Shimatsu ; I. Watanabe ; H. Muraoka
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The induced uniaxial anisotropy field Hk in very thin films sandwiched by Ta or Cu layers was investigated. The value of Hk of the Ta/Cu/Ni79Fe21/Cu/Ta film decreases as film thickness decreases below 20 nm, even after an annealing procedure in a magnetic field. This Hk reduction is similar to that of the Ta/Ni79Fe21/Ta films, indicating that the Hk reduction is independent of surface energy and/or crystal structure of seed layers. The value of film magnetostriction λp-p of the Ta/NiFe/Ta films gradually increases as the thickness decreases, which is coincident with the reduction of Hk. However, the increase of the λ p-p values, by decreasing Ni concentration or annealing the films, resulted in conflicting Hk values. These results indicate that the Hk reduction in thin films is not simply caused by the magnetostrictive effect

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IEEE Transactions on Magnetics  (Volume:37 ,  Issue: 4 )