Cart (Loading....) | Create Account
Close category search window
 

Characteristics of spin-valve films with non-magnetic oxide layers for specular-scattering

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Mizuguchi, Tetsuya ; Res. Center, Sony Corp., Yokohama, Japan ; Kano, Hiroshi

We found a new spin-valve structure in which low coercivity coexists with high GMR ratio is substrate/Ta/NiFe/PtMn/CoFe/Ru/Ox/CoFe/Cu/CoFe/Cu/Ta-O. “Ox” means that Ru layer surface was exposed to oxygen gas. In this structure, the free layer is separated from the top specular layer by a copper layer and shows no increase in coercivity. Furthermore, the free layer was well oriented due to the thin oxide layer in the bottom pinned layer and the coercivity did not increase. After annealing at 295°C, GMR and the exchange-bias field showed little change, which meant the oxide layers were stable. For the structure glass/Ta [3 nm]/NiFe [2 nm]/PtMn [10 nm]/CoFe [1.5 nm]/Ru [0.8 nm]/Ox/CoFe [2 nm]/Cu [2 nm]/CoFe [2 nm]/Cu [1 nm]Ta-O [1 nm], GMR ratio of 14.9% and change in sheet resistance of 3.3 ohms were obtained. The coercivity of the free layer exhibited 0.4 Oe

Published in:

Magnetics, IEEE Transactions on  (Volume:37 ,  Issue: 4 )

Date of Publication:

Jul 2001

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.