By Topic

Add-drop multiplexer with UV-written Bragg gratings and directional coupler in SiO2-Si integrated waveguides

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Mechin, D. ; France Telecom R&D, France ; Grosso, P. ; Bose, D.

The needs of wavelength multiplexers is growing and therefore optical add-drop multiplexers (OADMs) become key components for the advanced high bit rate telecommunication networks. Currently, one of the solutions to make OADMs use fiber Bragg gratings and circulators. In order to take advantage of integrated optics and to avoid the use of expensive circulators, we perform this kind of OADM in ridge silica waveguide on silicon. This technology makes possible short based directional coupler (DC) device. In previous work, we firstly realized an OADM which involves a symmetrical directional coupler combined with two Bragg gratings inside the coupling zone. The results meet difficult tradeoff between a high extinction ratio and a narrow spectral width of the rejection band. This paper reports some fabrication improvements for DC-OADM that lead to more efficient components, progress results from a lot of works concerning both the photo-writing process of Bragg gratings and the lowering of the waveguide internal stresses. Thus, we show that apodization of gratings and low birefringence in the waveguides enables us to achieve DC-OADM with an extinction ratio of 30 dB and a spectral bandwidth less than 1.5 nm

Published in:

Lightwave Technology, Journal of  (Volume:19 ,  Issue: 9 )