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157-nm coherent light source for F/sub 2/ laser lithography [spectrpmeter calibration]

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8 Author(s)
Suganuma, T. ; Dept. of Equip. Technol. Res., Hiratsuka Res. Center, Kanagawa, Japan ; Kubo, H. ; Wakabayashi, O. ; Mizoguchi, H.
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Summary form only given. F/sub 2/ lasers are taken notice of the light source for lithographic tools enabling structures below the 70 nm technology node. The F/sub 2/ laser linewidth is essential for the design of the lithography projection system. A dioptric design system requires the F/sub 2/ laser linewidth of about 0.2 pm (FWHM), which is due to the large dispersion of the refractive index of CaF/sub 2/ at 157 nm. Therefore the spectral measurement of a line-narrowed F/sub 2/ laser is very important. We have developed a 157 nm coherent light source (157CLS) to calibrate a VUV spectrometer. The 157CLS is required to have a very narrow linewidth, which can be approximated by a /spl delta/ function to a VUV spectrometer. This light source can also be used to inspect the optical systems by interferometry.

Published in:

Lasers and Electro-Optics, 2001. CLEO '01. Technical Digest. Summaries of papers presented at the Conference on

Date of Conference:

11-11 May 2001