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Memory operations of 1T2C-type ferroelectric memory cell with excellent data retention characteristics

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2 Author(s)
Sung-Min Yoon ; R&D Assoc., Future Electron Devices, Tokyo, Japan ; Ishiwara, Hiroshi

A novel FET-type ferroelectric memory cell with one-transistor, and two-capacitor (1T2C) structure was fabricated and characterized, in which the generation of depolarization field in ferroelectric film during data retention was suppressed by polarizing two ferroelectric capacitors in opposite directions. It was demonstrated that the stored data were nondestructively read-out and their retention time was much longer than that of conventional ferroelectric-gate FET

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Electron Devices, IEEE Transactions on  (Volume:48 ,  Issue: 9 )