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An efficient treatment technique for TMAH wastewater by catalytic oxidation

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6 Author(s)
K. Hirano ; NEC Corp., Kawasaki, Japan ; J. Okamura ; T. Taira ; K. Sano
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Developers used in photolithography contain toxic tetramethylammoniumhydroxide (TMAH) and this creates a problem of how to properly treat developer wastewater. We have developed a TMAH wastewater treatment technique that consists of a combination of two novel decomposition processes: pyrolyzing TMAH to TMA and decomposing TMA to N 2, H2O, and CO2 by means of a selective oxidation catalyst for nitrogenous compounds. We have tested a system using this technique in long-term treatment of the actual wastewater and have found it to be sufficiently practical. The running cost of a treatment system using our technique would be about one-ninth that of disposing of the wastewater as industrial waste but about 2.3 times that of biological treatment. Compared with biological treatment, however, our system is tolerant to many treatment conditions and operation management is much easier. Furthermore, it occupies only about one-sixth the area of a biological treatment system

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IEEE Transactions on Semiconductor Manufacturing  (Volume:14 ,  Issue: 3 )