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Analysis of an octagonal micromachined horn antenna for submillimeter-wave applications

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7 Author(s)
Hesler, J.L. ; Dept. of Electr. Eng., Virginia Univ., Charlottesville, VA, USA ; Hui, K. ; Dahlstrom, R.K. ; Weikle, R.M.
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An analysis is presented of a new horn antenna, fabricated by a novel micromachining technique, that uses crystallographic etching of silicon and ultraviolet lithography of an ultra-thick photoresist (SU-8). The horn was found to have low cross-polarized field levels and a predicted Gaussian coupling efficiency of 92.5%. The horn shape is governed by the crystal planes of the silicon substrate and the thickness of the photoresist and has up to four independent design parameters that allow a wide range of antenna patterns. A design for the horn that yields symmetric beam patterns was investigated by computer analysis, microwave scale modeling, and measurements of a micromachined horn at 585 GHz. The major features of the 585-GHz beam patterns agree well with the computer-generated and scaled beam patterns. We have thus demonstrated a new micromachinable horn that has great potential for integration into array structures

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Antennas and Propagation, IEEE Transactions on  (Volume:49 ,  Issue: 6 )