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Evaluation of high-performance SOI complementary BiCMOS devices by using test structures

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8 Author(s)
Tamaki, Y. ; Device Dev. Center, Hitachi Ltd., Tokyo, Japan ; Iwasaki, T. ; Tsuji, K. ; Chida, Y.
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We used new test structures to evaluate the performance of complementary bipolar transistors fabricated on a SOI substrate by a new 0.35 μm complementary BiCMOS process. The fabricated NPN transistors have a cut-off frequency (fT) of 10.5 GHz at a C-E breakdown voltage of 19.5 V and the PNP transistors have fT of 6.0 GHz at 17.8 V. The test structure measurement showed that the high performance is due to the new isolation structure of the BiCMOS transistor and its layout

Published in:
Microelectronic Test Structures, 2001. ICMTS 2001. Proceedings of the 2001 International Conference on

Date of Conference: 2001

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