Cart (Loading....) | Create Account
Close category search window
 

An investigation of laser annealed and metal-induced crystallized polycrystalline silicon thin-film transistors

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Murley, D. ; Thin Film Electron. Group, Philips Res. Lab., Redhill, UK ; Young, N. ; Trainor, M. ; McCulloch, D.

We report results on thin-film transistors (TFTs) made from a new hybrid process in which amorphous silicon (a-Si) is first converted to polycrystalline silicon (poly-Si) using Ni-metal-induced lateral crystallization (MILC), and then improved using excimer laser annealing (laser MILC or L-MILC). With only a very low shot laser process, we demonstrate that laser annealing of MILC material can improve the electron mobility from 80 to 170 cm2/Vs, and decrease the minimum leakage current by one to two orders of magnitude at a drain bias of 5 V. Similar trends occur for both p- and n-type material. A shift in threshold voltage upon laser annealing indicates the existence of a net positive charge in Ni-MILC material, which is neutralised upon laser exposure. The MILC material in particular exhibits a very high generation state density of ~1019 cm-3 which is reduced by an order of magnitude in L-MILC material. The gate and drain field dependences of leakage current indicate that the leakage current in MILC transistors is related to this high defect level and the abruptness of the channel/drain junction. This can be improved with a lightly doped drain (LDD) implant, as in other poly-Si transistors

Published in:

Electron Devices, IEEE Transactions on  (Volume:48 ,  Issue: 6 )

Date of Publication:

Jun 2001

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.