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Submicron NbN Josephson tunnel junctions for digital applications

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5 Author(s)
M. Aoyagi ; Electrotech. Lab., Ibaraki, Japan ; A. Shoji ; S. Kosaka ; H. Nakagawa
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Submicron NbN/MgO/NbN Josephson tunnel junctions for Josephson integrated circuits were investigated. The junctions have been fabricated by the cross-line patterning (CLIP) method with an electron-beam (EB) direct-writing technique. The all-refractory fabrication process for logic circuits using the CLIP method is presented. This process is applied to the fabrication of a logic gate of 4JL containing 0.8-μm-square junctions as an example of digital application. A logic gate has been fabricated by this process, and its characteristics are discussed

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IEEE Transactions on Magnetics  (Volume:25 ,  Issue: 2 )