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OH radical measurement in a pulsed arc discharge plasma observed by a LIF method

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2 Author(s)
R. Ono ; Dept. of Electr. Eng., Tokyo Univ., Japan ; T. Oda

Hydroxyl radicals generated by a pulsed arc discharge were measured by laser-induced fluorescence (LIF) with a tunable KrF excimer laser. It was shown that not only OH but excited O2 (O2 *) and excited NO (NO*) had absorption lines within a tunable range of the KrF laser, so that LIF signals of O2 * and NO* were observed as well as OH signals. It was demonstrated that OH could be detected without disturbance by LIF signals of O2* or NO* through the A-X(3,0):P2(8) excitation; OH density was measured under various conditions in the post-discharge region. The influences of humidity, discharge current, and O2 concentration on OH density and OH decay rate were studied in H2 O/O2/N2 mixture. The results provided some possible channels of OH production and reaction with other molecules in humid air. The absolute density of OH was estimated

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IEEE Transactions on Industry Applications  (Volume:37 ,  Issue: 3 )