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Surface-micromachined 2-D optical scanners with high-performance single-crystalline silicon micromirrors

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3 Author(s)
Su, G.-D.J. ; Dept. of Electr. Eng., California Univ., Los Angeles, CA, USA ; Toshiyoshi, H. ; Wu, M.C.

We have developed a novel batch-fabrication single-crystalline silicon micromirror bonding process to fabricate optically flat micromirrors on polysilicon surface-micromachined two-dimensional (2-D) scanners. The electrostatically actuated 2-D scanner has a mirror area of 460 /spl mu/m/spl times/460 /spl mu/m and an optical scan angle of /spl plusmn/7.5/spl deg/. Compared with micromirror made by standard polysilicon surface-micromachining process, the radius of curvature of the micromirror has been improved by 150 times from 1.8 to 265 cm, with surface roughness <10 nm.

Published in:

Photonics Technology Letters, IEEE  (Volume:13 ,  Issue: 6 )

Date of Publication:

June 2001

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