By Topic

FeNi and Ti underlayers for vertical recording on rigid disks

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

1 Author(s)
Jeanniot, D. ; Bull SA, Les Clayes-sous-Bois

FeNi and Ti underlayers on CoCr disks are studied. It is confirmed that the structure of FeNi thin films is derived from pure Ni cfc structure. Soft magnetic films can be achieved when sputtering conditions are optimized for an Fe2ONi80 target. Sputtering conditions were also studied for Ti layers. It was found that Ti thin films crystallize in the hcp structure. An (002) crystallographic preferred orientation was generally observed, but it can be improved for thinner films and when high cathode voltage is used during deposition. A (100) orientation is observed if high bias voltage is applied to the substrate during deposition. Both structures, when used as underlayers, improve the vertical anisotropy of CoCr, but (100) Ti underlayers lead to a higher vertical anisotropy

Published in:

Magnetics, IEEE Transactions on  (Volume:24 ,  Issue: 6 )