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Growth of large area YBa2Cu3O7-x thin film by cylindrical hollow cathode sputtering

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4 Author(s)
Jeong-Dae Suh ; Electron. & Telecommun. Res. Inst., Taejon, South Korea ; Seok Kil Han ; Kwang Yong Kang ; Min Hwan Kwak

We have deposited large area YBa2Cu3O7-x thin films by cylindrical hollow cathode sputtering using a 9 cm diameter hollow cathode sputtering gun. The zero resistance temperature of the films at the center and edge were in the range from 86 K to 83 K. X-ray diffraction analysis and scanning electron micrographs showed that the films are completely c-axis oriented. The variation of the thickness was less than 5% over the whole substrate. The values of microwave surface resistance were 1 mΩ at 25 K and 40 mΩ at 77 K and 19.6 GHz

Published in:

IEEE Transactions on Applied Superconductivity  (Volume:11 ,  Issue: 1 )