Scheduled System Maintenance on May 29th, 2015:
IEEE Xplore will be upgraded between 11:00 AM and 10:00 PM EDT. During this time there may be intermittent impact on performance. For technical support, please contact us at onlinesupport@ieee.org. We apologize for any inconvenience.
By Topic

Low loss and high extinction ratio strictly nonblocking 16×16 thermooptic matrix switch on 6-in wafer using silica-based planar lightwave circuit technology

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Goh, T. ; NTT Photonics Labs., Ibaraki, Japan ; Yasu, M. ; Hattori, K. ; Himeno, A.
more authors

We describe a silica-based 16×16 strictly nonblocking thermooptic matrix switch with a low loss and a high extinction ratio. This matrix switch, which employs a double Mach-Zehnder interferometer (MZI) switching unit and a matrix arrangement to reduce the total waveguide length, is fabricated with 0.75% refractive index difference waveguides on a 6-in silicon wafer using silica-based planar lightwave circuit (PLC) technology. We obtained an average insertion loss of 6.6 dB and an average extinction ratio of 53 dB in the worst polarization case. The operating wavelength bandwidth completely covers the gain band of practical erbium-doped fiber amplifiers (EDFAs). The total power consumption needed for operation is reduced to 17 W by employing a phase-trimming technique which eliminates the phase-error in the interferometer switching unit

Published in:

Lightwave Technology, Journal of  (Volume:19 ,  Issue: 3 )