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A system model for feedback control and analysis of yield: A multistep process model of effective gate length, poly line width, and IV parameters

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5 Author(s)
E. A. Rietman ; Lucent Technol. Bell Labs., Orlando, FL, USA ; S. A. Whitlock ; M. Beachy ; A. Roy
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We present a large system model capable of producing Pareto charts for several yield metrics, including effective channel length, poly line width, Ion and Isub. These Pareto charts enable us to target specific processes for improvement of the yield metric(s). Our neural network model has an accuracy of 80% and can be trained with a small data set to minimize the feedback time in the control loop for the yield. The system we describe has been implemented in a Lucent Technologies microelectronics lab in Orlando, FL

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IEEE Transactions on Semiconductor Manufacturing  (Volume:14 ,  Issue: 1 )