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Improved RF integrated magnetic thin-film inductors by means of micro slits and surface planarization techniques

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9 Author(s)
M. Yamaguchi ; Inst. of Electr. & Commun. Eng., Tohoku Univ., Sendai, Japan ; M. Baba ; K. Suezawa ; T. Moizumi
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Improvement of magnetic thin-film inductors for RF monolithic microwave integrated circuits (MMICs) is discussed. Surface planarization reduced the surface roughness down to Ra=1.2 nm, which enhanced the quality factor by 14% over a nonplanarized inductor. The orthogonal bar slit pattern was the best among the fabricated slit patterns, L=7.55 nH (+12% of the air core), R=6.80 Ω and Q=7.09 (+9%) were obtained for the orthogonal bar slit pattern (slit width=0.75 μm) with surface planarization

Published in:

IEEE Transactions on Magnetics  (Volume:36 ,  Issue: 5 )