Sensitive asymmetrical MI effect in crossed anisotropy sputtered films

This paper reports experimental results to obtain a sensitive and asymmetrical MI effect in crossed anisotropy sputtered films magnetized with a DC-biased AC or pulse current. The sensitive and asymmetrical MI effect occurs, because the crossed anisotropy films induce spiral magnetic anisotropy. The crossed anisotropy film (Co/sub 72/Fe/sub 8/B/sub 20/) was made on a glass substrate using DC sputtering with two layers having 4.5 /spl mu/m thickness each applying a DC field of 21 kA/m along with a designed anisotropy direction. A linear MI characteristic with a field detection sensitivity of 0.15%/(A/m) (12%/Oe) was obtained, which realizes a sensitive linear field sensor without any DC bias field.