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Correlations among sputter pressure, thickness, and coercivity in Al/Co/Cu magnetic thin films sputtering

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5 Author(s)
Barnes, B.M. ; Wisconsin Univ., Madison, WI, USA ; Kelly, J.J. ; MacKay, J.F. ; O'Brien, W.L.
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We demonstrate the effect of sputter gas pressure and film thickness, d, on the coercivity of Co in Al/Co/Cu sputterdeposited on Si(001). Increased sputter gas pressure produces increased rms roughness and increased O content in our films. The deposited Co thickness at which the onset of ferromagnetism is first observed, dc, increases with sputter gas pressure. Above this thickness,d > dc, the coercivity increases with increasing Co thickness. For film thickness d ≫ dc, the coercivity is thickness independent. We show that coercivity is directly controllable at technologically relevant thicknesses by regulating sputter-deposition parameters.

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Magnetics, IEEE Transactions on  (Volume:36 ,  Issue: 5 )