Highly-textured AlN films were obtained by using a Helicon sputtering system. This sputtering method was able to sustain the plasma in a gas atmosphere of 10-4 Torr, and, in turn, to improve the surface morphology of the film. The AlN film exhibits an extremely smooth surface with a root mean square roughness of only 3.7 Å
Published in:
Electronics Letters
(Volume:37
,
Issue:
4
)
Date of Publication: 15 Feb 2001