By Topic

MEMS techniques applied to the fabrication of anti-scatter grids for X-ray imaging

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Lehmann, V. ; Dept. CPR ET, Infineon Technol., Munich, Germany ; Ronnebeck, S.

This paper reports a promising method for the fabrication of lead collimators for X-ray radiology applications. The fabrication method is based on arrays of macropores etched into a silicon wafer using an electrochemical process. The macropores are filled with lead and the silicon substrate is removed subsequently. The macroporous silicon structure thereby acts as a sacrificial layer. The use of MEMS techniques enables us to decrease the size of the structure by one order of magnitude compared to conventional collimators, thus increasing the optical resolution of the X-ray system.

Published in:

Micro Electro Mechanical Systems, 2001. MEMS 2001. The 14th IEEE International Conference on

Date of Conference:

25-25 Jan. 2001