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Pilot studies of the manufacturing worthiness of mixed chemistry processings in a MERIE plasma tool

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7 Author(s)

This paper presents ground level feasibility study of mix-run capability on applications of metal via etches in a simulated production environment. A mini-marathon was set up to understand any particulate problems and process shift during mix-run in a MERIE plasma etch tool-a commercially available Super e chamber. Particulate, oxide and PR etch rate data will be shown to demonstrate that Super e is a production worthy etch tool for mix-run with different chemistries on metal via etch applications

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI

Date of Conference:

2000

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