Cart (Loading....) | Create Account
Close category search window

Quantifying the capability of a new in-situ interferometer

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Roberts, B. ; Infineon Technol., San Diego, CA, USA ; Guerrero, J. ; Gould, C. ; Ribitz, K.
more authors

As design specifications push the limits of optical lithography deep into sub-λ imaging requirements, characterization of imaging tools has become increasingly more important and difficult. The customary Usable Depth of Focus (UDOF) and Distortion testing no longer provide all information necessary to predict the capability of the imaging tools. Process variations and sensitivities convolute the findings of many tool acceptance tests and can mask the true capability of todays High NA imaging tools. A new interferometer imaging tool developed by Litel Instruments (InspecStepTM in-situ Interferometer) has been shown to be able to measure the distortion coefficients which are as accurate as conventional Phase Measurement Interferometer (PMI) techniques used by lens manufacturers. We will collect and present data quantifying the capability of this new tool. Repeatability and Reproducibility will be presented in terms of spherical wavefront aberration (rms) as well as comparisons of Zernike coefficients to vendor PMI data. Output configuration compatibility for commercially available lithographic simulators will be demonstrated. Finally a matching study will be presented in which we compared the predictions and calculations of interferometers

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI

Date of Conference:


Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.