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In-line wafer inspection data warehouse for automated defect limited yield analysis

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5 Author(s)
H. Iwata ; Production Eng. Res. Lab., Hitachi Ltd., Yokohama, Japan ; M. Ono ; J. Konishi ; S. Isogai
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A data warehouse approach for the automation of process zone-by-zone defect limited yield analysis is presented in this paper. The system employs pre-calculation of adder defects extraction and clustered defects recognition, a newly developed wafer-wise defect record structure, and a graphical user interface purpose-designed for data selection navigation. Analysis time can be reduced to less than 1% of that of benchmarked conventional procedures

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Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI

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