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The positive cycle time impact of closely monitoring your factory's critical tools

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7 Author(s)
Berry, J.L. ; Adv. Products Res. & Dev. Lab., Motorola Inc., Austin, TX, USA ; Pierce, N. ; Serrano, L. ; Stankus, S.
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Summary form only given, as follows. The Advanced Products Research and Development Laboratory (APRDL) is Motorola's most advanced semiconductor process development facility. APRDL continuously develops leading-edge, cost effective technologies. Such development work requires many experiments while maintaining a high product mix and a low wafer inventory. As a result, APRDL has numerous one-of-a-kind tools and a large number of single wafer and split lots. A significant percentage of our inventory is on hold at any given time. For these reasons, monitoring performance at critical tools presents a greater challenge within an R&D pilot line than in a manufacturing facility. In order to dispatch lots effectively, APRDL's Manufacturing Management Team has chosen a multidimensional approach making use of a variety of tools. Lot scheduling is based on meeting objectives including priority, lot commitments, cycle time and throughput goals, and on-time delivery using the Theory of Constraints. This is realized through a dynamic lot dispatching system. Bottleneck and critical tools are identified, future tool requirements are determined and what if scenarios are explored using discrete event factory simulation. The operational requirements are aided using several different tools. Real-time data from the line is closely monitored through a real-time graphical based information system. Staffing levels are monitored and staff moved to ensure operator/technician coverage at critical tools. Special projects are identified and engineering efforts are applied. Finally, daily and weekly line metrics are tracked and reported during daily meetings. This presentation will explore the necessity of such a multidimensional approach, the required reporting tools, and the operational considerations. It will also discuss the improvements that have been achieved

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI

Date of Conference:

2000

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