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New self-aligned micromachining process for large free-space optical cross-connects

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5 Author(s)
Helin, P. ; LIMMS, Tokyo Univ., Japan ; Bourouina, T. ; Mita, M. ; Reyne, G.
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An improved self-aligned micromachining process for large-scale free-space optical cross-connect is presented. It satisfies the high accuracy optical alignment required for such application. This self-aligned batch process allows the simultaneous fabrication of vertical mirrors and fiber guides. It is performed in one level of mask lithography and combines deep RIE and KOH silicon etching

Published in:

Optical MEMS, 2000 IEEE/LEOS International Conference on

Date of Conference:

2000