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New self-aligned micromachining process for large free-space optical cross-connects

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5 Author(s)
Helin, P. ; LIMMS, Tokyo Univ., Japan ; Bourouina, T. ; Mita, M. ; Reyne, G.
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An improved self-aligned micromachining process for large-scale free-space optical cross-connect is presented. It satisfies the high accuracy optical alignment required for such application. This self-aligned batch process allows the simultaneous fabrication of vertical mirrors and fiber guides. It is performed in one level of mask lithography and combines deep RIE and KOH silicon etching

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Optical MEMS, 2000 IEEE/LEOS International Conference on

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