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Chemically amplified electron beam positive resist with acetal protecting group-effect of the additives on resist properties

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3 Author(s)
Saito, Satoshi ; Corp. Res. & Dev. Center, Toshiba Corp., Kawasaki, Japan ; Kihara, Naoko ; Ushirogouchi, Tohru

We discuss a high-sensitivity electron beam (EB) positive resist based on acetal-protected poly(hydroxystyrene) (PHS) and also propose a new chemical amplification system. In this system, the generated acid after EB exposure acts as the catalyst for the deprotection reaction, as well as the water-generating reaction. This system can make the combination of acetal protecting group and strong acid possible in EB lithography.

Published in:

Microprocesses and Nanotechnology Conference, 2000 International

Date of Conference:

11-13 July 2000

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