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Prediction of resist non-uniformity caused by underlying pattern density and topology

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6 Author(s)
Jin-Young Kim ; Hanyang Univ., Ansan, South Korea ; Dong-Su Son ; Eun-Jung Seo ; Young-Soo Sohn
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We developed a simulator that can predict spin coated resist thickness with different feature type, density and topology by using dimensionless parameter and liquid resist film thickness. The change of critical dimension with surrounding topology and pattern density is simulated for the non-uniform resist thickness.

Published in:

Microprocesses and Nanotechnology Conference, 2000 International

Date of Conference:

11-13 July 2000